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美國(guó)OAI光刻機(jī) 5000E

詳細(xì)介紹

型號(hào)5000E大面積光刻機(jī)用于基板和顯示器

OAI 5000E型大面積掩光刻機(jī)是一種先進(jìn)的高性能，全自動(dòng)掩模對(duì)準(zhǔn)器和曝光工具，可為大型平板應(yīng)用提供超精密，**，亞微米對(duì)準(zhǔn)和分辨率。 其靈活的設(shè)計(jì)允許在各種基材（圓形或方形）上印刷高達(dá)300mm或20“×20”。 曝光系統(tǒng)兼容近，中，或深紫外范圍的光刻膠，并具有計(jì)算機(jī)控制的LED顯微鏡照明，在不太理想的觀察環(huán)境中觀察。

Model 5000E Large Area Mask Aligner for Substrates and Displays

The OAI Model 5000E Large Area Mask Aligner is an advanced， high-performance， fully-automated mask Aligner and exposure tool that delivers ultra precise， Topside， sub-micron alignment and resolution for large， flat panel applications. Its flexible design allows printing on various substrates - round or square - up to 300mm or 20”x20”. The exposure system is compatible with photo resist in Near， Mid， or Deep UV range， and features computer-controlled LED microscope lighting for viewing in less-than-ideal viewing environments.